面向尖端科研試驗的新型晶體生長設備

AsiaNet 45273

 

亞洲網德國 Wettenberg 7月4日電:位於德國 Wettenberg,在矽晶體生長設備及高溫真空設備領域占有技術領先地位的設備製造商PVA TePla 集團,成功地研發了針對科研試驗領域的新型晶體生長設備–“CGS-Lab"。該設備采用直拉 (Czochralski)工藝拉晶,是遵照由德意志聯邦教育與科研發展部主導並推動的"精英集群"競賽項目的要求開發研製而成。與廣泛應用於半導體和光伏領域的大型直拉單晶設備相比較,CGS-Lab 因其靈巧而不失精密的結構設計,不僅可廣泛應用於光伏、半導體和光學等諸多工業領域,而且更加適用於大學,研究院等科研機構的尖端科研領域。

 

例如在多晶矽製造商和光伏企業,CGS-Lab 特別適用於迅速快捷地檢查原材料及成品材料的材料特性,定制材料標準,並且該設備也通過測試,適用於太陽能電池板材料的優化(Si, Ge),聚光光伏和紅外光學等領域。

 

該設備的優勢體現在:占地面積小、工藝周期短、僅需投入少量的人力、物力以及能耗,使客戶能夠在最短的時間以最小的投入獲得預期結果。此外,該設備爲全自動工藝設計,具有維護簡便、操作簡單等諸多優點。並且透過內置圖形用戶界面可對所有設備和工藝參數進行實時監控。

 

關於設備詳情,請聯繫:

 

Heiko Goritzka 先生

PVA TePla AG

電話:+49(0)641/68690-155

信箱: heiko.goritzka@pvatepla.com

網址: http://www.pvatepla.com

 

消息來源: PVA TePla AG

 

 

 

 

New Crystal-growing System on a Laboratory Scale

AsiaNet 45273

WETTENBERG, Germany. July 4, /PRNewswire-AsiaNet/ —

   
    PVA Vakuum Anlagenbau Jena GmbH, a subsidiary of PVA TePla AG, a leading
manufacturer of silicon crystallization systems and of vacuum and
high-temperature systems, has developed the “CGS Lab", a technologically
innovative crystal-growing system on a laboratory scale. The CGS Lab, built
in the context of the “Spitzencluster" competition sponsored by the German
Federal Ministry of Education and Research, is designed to manufacture
monocrystalline ingots using the Czochralski method. In contrast to its
larger counterparts, which are already in use in the semiconductor and
photovoltaic industries, this system is particularly attractive both for
industrial application in the solar, semiconductor and optical industries
and for basic research at institutes and universities as a result of its
smaller scale.

    The CGS Lab is particularly suitable for fast and efficient material
characterization for receiving and pre-delivery inspections and
standardization, e.g. for polysilicon manufacturers and photovoltaic
companies, but also for optimization of solar cell material (Si, Ge),
concentrator photovoltaics and infrared optics.

    The advantages of the system are its low space requirement and short
process times with low staff, material, media and energy utilization levels,
which enable fast, cost-efficient results. These are supplemented by low
maintenance requirements, ease of use and full process automation. Control
of all parameters is possible at any time via an integrated, graphical user
interface.
   
    For further information, please contact:
    Heiko Goritzka
    PVA TePla AG
    Phone: +49(641)/68690-155
    Heiko.goritzka@pvatepla.com
    http://www.pvatepla.com

    Source: PVA TePla AG

 

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